Intel Foundry has begun high-volume manufacturing of select Intel Core Ultra Series 3 processors, known as Panther Lake, using ASML's High NA EUV lithography on the Intel 18A process node. This marks a key milestone in semiconductor manufacturing, demonstrating the readiness of High NA EUV technology for production with yields comparable to previous platforms. The collaboration between Intel and ASML aims to enhance chip resolution and process control, enabling smaller, denser patterns critical for advancing AI and other technologies. This development sets the stage for broader adoption of High NA EUV in future semiconductor nodes based on customer needs.
China now requires semiconductor fabs to use at least 50% domestically produced equipment for new capacity, favoring local suppliers like Naura and AMEC. This policy, combined with U.S. export restrictions, limits Applied Materials' access to China's...
The Investing for Beginners Podcast outlined a three-tier framework for AI investing: semiconductors, major infrastructure, and AI companies. They recommend focusing on structural chokepoints in semiconductors (TSMC, ASML) and cloud infrastructure (A...
ASML reported a record Q2 with $10.65 billion revenue, driven by strong AI chip demand and upgrade services, expecting EUV system sales to grow over 45% this year. Canon focuses on nanoimprint lithography for memory and mature logic chips, targeting ...
